Global Atomic Layer Deposition Market: Overview
The Global Atomic Layer Deposition Market to grow by increasing demand in the Global Atomic Layer Deposition Market, 2014-2020 by, According to a new report by Syndicate Market Research
Atomic layer deposition (ALD) is a thin layer deposition process that is based on the chronological exploitation of a gas phase chemical course. ALD is considered a subclass of chemical vapor deposition. The majority of ALD reactions use two chemicals, usually called precursors. ALD is mostly used to produce competent semiconductors. Nanotechnology, microelectronics, electronic displays, optical data storage devices, electronic components, and the bio-medical field are the key applications of atomic layer disposition market.
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Global Atomic Layer Deposition Market: Growth Factors
ALD market is primarily driven by increasing demand from electronics industry especially in the emerging economies of Asia Pacific and Latin America. Improvement in nanotechnology is likely to propel the demand for atomic layer deposition over the years to come. However, substrates employed in atomic layer deposition instruments compared to conventional methods is expected to hold back the growth of the market. Investment for advanced manufacturing equipment is expected to offer new opportunities for this emerging market.
Global Atomic Layer Deposition Market: Segmentation
The report forecasts value of the global atomic layer deposition market and its various applications with respect to main regions namely, North America, Europe, Asia-Pacific, Latin America and Middle East & Africa with its further bifurcation into major countries including U.S., Germany, France, UK, China, Japan, India, and Brazil. This segmentation includes demand for atomic layer deposition market based on individual products in all the regions and countries.
The report provides a comprehensive view of the atomic layer deposition market we have included a detailed competitive scenario and product portfolio of key vendors. To understand the competitive landscape in the market, an analysis of Porter’s Five Forces model for the atomic layer deposition market has also been included. The study encompasses a market attractiveness analysis, wherein application segments are benchmarked based on their market size, growth rate, and general attractiveness.
The global atomic layer deposition market is segmented on the basis of applications and regions. Based on different application, a market is segmented as IC applications and non-IC applications. IC applications include gate oxide, barrier layers, primer layers and gate electrode. Non-IC applications include sensors, flat panel displays, solar panels, magnetic heads, memories and fuel cells.
Global Atomic Layer Deposition Market: Regional Analysis
Europe is a leading region among all regions for atomic layer deposition market. In addition, North America and Asia Pacific are the mature market and further estimated to have significant growth during the forecast period. From Asia Pacific region, India and China are likely to be the major markets for atomic layer deposition owing to the existence of reputable end-user industries.
Global Atomic Layer Deposition Market: Competitive Players
Some of the key participants of the global atomic layer deposition market include Tokyo Electron Ltd., Hitachi Kokusai Electric Inc., Air Products and Chemicals, Inc., Ultratech, Inc., Air Liquide S.A., Centrotherm Photovoltaics AG, Tosoh Corporation, Applied Materials, Inc., and ASM International N.V. amongst others.
Key segments of the Global Atomic Layer Deposition Market
Atomic Layer Deposition Market: Application Segment Analysis
- IC Applications
- Gate oxide
- Barrier layers
- Primer layers
- Gate electrode
- Non-IC Applications
- Flat Panel Displays
- Solar panels
- Magnetic heads
- Fuel cells
Atomic Layer Deposition Market: Regional Segment Analysis
- North America
- Asia Pacific
- Latin America
- The Middle East & Africa
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